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  • DC/RF Nano High-Precision Sputtering Coater Film Deposition System With Rotatable Triple-targets
DC/RF Nano High-Precision Sputtering Coater Film Deposition System With Rotatable Triple-targets

DC/RF Nano High-Precision Sputtering Coater Film Deposition System With Rotatable Triple-targets

  • Product Name:DC/RF Nano High-Precision Sputtering Coater Film Deposition System With Rotatable Triple-targets
  • Model:Lith-PC-JS03
  • Brand Name: KAT
  • Email: saleskatbattery@gmail.com
  • Mobile: +86 18650702009
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Product Details

DC/RF Nano High-Precision Sputtering Coater Film Deposition System With Rotatable Triple-targets 



Model: Lith-PC-JS03-Rotatable Triple-targets 


Technical Specifications

Category

Parameter

Value/Description

Chamber Structure

Design

Vertical front-loading, stainless steel

 

Sample Access

Easy loading/unloading

Vacuum Performance

Base Pressure

≤5×10−5 Pa

 

Leak Rate

≤5×10−7 Pa·L/s

 

Pressure Rise Rate (12h)

≤10 Pa

 

Pumping System

Domestic molecular pump + mechanical pump

Targets & Power Supplies

Target Quantity & Size

3 × 2-inch magnetron targets (HV compatible)

 

Target Types

1 × Standard magnetic field, 1 × Strong magnetic field

 

Target-Substrate Distance (Multilayer)

40–120 mm

 

Target-Substrate Distance (Ion Source)

80–120 mm

 

RF Power Supply

1 × 1000 W, 13.56 MHz (auto-matching)

 

DC Power Supply

2 × 1000 W

Substrate Holder

Capacity

Up to 3 substrates

 

Rotation Speed

5–30 RPM (self-rotation + planetary)

 

Heating Range

Programmable up to 450°C

 

Bias Voltage

Supports up to 1000 V

Gas Control System

Gas Lines

2 independent MKS mass flow controllers (Ar + reactive gas)

 

Features

Gas mixing, adjustable/measurable chamber pressure

Additional Features

Chamber Baking

Infrared heating (150°C)

 

Liner Plate

Prevents chamber contamination

 

Safety Protections

Water/power failure interlock, anti-misoperation protection


Key Features & Applications

1. Advanced Deposition Capabilities

· Supports for metals, semiconductors, and insulators.

· Triple-target design enables sequential multilayer deposition without vacuum breaks.

2. Precision Process Control

· Programmable substrate heating (±450°C) with adjustable ramp rates.

· Rotation mechanism (5–30 RPM) ensures uniform film thickness.

3. Research & Small-Batch Flexibility

· Ideal for nanoscale functional films (e.g., optoelectronics, tribological coatings).

· Reverse sputtering cleaning enhances film adhesion and purity.

4. User-Centric Design

· Manual controls for target shutters, rotation, and temperature.

· Safety systems mitigate operational risks (e.g., interlock protections).


Target Users

· Academic & Government Labs: Thin-film material R&D.

· Industrial Prototyping: Small-scale production of specialized coatings.


 Sputtering Coater





PACKAGE:
     1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
     2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
     3 Responsible for the damage during the shipping process, will change the damage part for you for free.
 

DELIVERY TIME: 15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity

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CONTACT US

Contact: Lily You

Phone: +86 18650702009

Tel: +86 18650702009

Email: saleskatbattery@gmail.com

Add: ‌No. 988 Xiahe Road, Siming District, Xiamen City