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  • Sputtering and Thermal Evaporation Physical Vapor Deposition Equipment For Metal Conductive Film
  • Sputtering and Thermal Evaporation Physical Vapor Deposition Equipment For Metal Conductive Film
Sputtering and Thermal Evaporation Physical Vapor Deposition Equipment For Metal Conductive Film Sputtering and Thermal Evaporation Physical Vapor Deposition Equipment For Metal Conductive Film

Sputtering and Thermal Evaporation Physical Vapor Deposition Equipment For Metal Conductive Film

  • Product Name:Sputtering and Thermal Evaporation Physical Vapor Deposition Equipment For Metal Conductive Film
  • Model:Lith-BY-ZD05
  • Brand Name: KAT
  • Email: saleskatbattery@gmail.com
  • Mobile: +86 18650702009
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Product Details

Sputtering and Thermal Evaporation Physical Vapor Deposition Equipment For Metal Conductive Film



Lith-BY-ZD05| Ion Sputtering & Evaporation Coater for SEM


Specification

Integrated with, this compact and user-friendly instrument is designed for high-quality thin-film deposition, particularly for SEM sample preparation. It supports multiple metal targets for sputtering and carbon fiber evaporation, offering precise control over coating parameters.


Technical Specifications

Parameter

Value

Dimensions

305 mm × 400 mm × 390 mm (W×D×H)

Vacuum Chamber Material

Borosilicate glass, 160 mm × 110 mm (D×H)

Target (Upper Electrode)

50 mm × 0.1 mm (D×H)

Sputtering Targets

Au (standard), optional Ag, Pt, etc.

Target Size

φ50 mm

Sample Stage

Compatible with 50 mm/70 mm diameter; customizable

Sputtering Voltage

0–1600 V (DC), adjustable

Sputtering Current

0–50 mA

Sputtering Timer

0–360 s

Carbon Evaporation Current

0–100 A (AC)

Evaporation Material

Carbon fiber

Evaporation Voltage

0–30 V

Evaporation Time

0–1 s

Gas Inlet Valve

Compatible with φ3 mm tubing

Process Gases

Multiple options

Power Supply

220 V (110 V optional), 50 Hz

Vacuum Pump

2L rotary vane pump (VRD-8, domestic)


Key Features

1. Dual-Function Design

·Combines ion sputtering (Au, Pt, Ag, Cu, etc.) and thermal evaporation (carbon fiber) for versatile applications.

·Ideal for high-resolution microscopy (SEM, TEM, EBSD) requiring ultra-fine carbon films (<1 nm).

2. Precision Control

·Adjustable sputtering currentvacuum pressure, and gas selection to optimize coating rate and particle size.

·Digital timer for reproducible processes.

3. Enhanced Sample Protection

·Conductive coatings eliminate charging effects in non-conductive samples.

·Carbon films protect beam-sensitive materials (e.g., biological/plastic samples) from electron beam damage.

4. Efficiency & Reliability

·Compact footprint with automated vacuum protection to prevent short circuits.

·Uniform film deposition with short processing time.


Applications

· Electron Beam-Sensitive Samples (e.g., polymers, biological tissues): Coating mitigates structural damage.

· Non-Conductive Materials: Metal layers (Au, Pt) dissipate charge, improving SEM imaging.

· Advanced Materials: Enhances conductivity and surface analysis (EBSD, microprobe) for semiconductors/composites.



Physical Vapor Deposition


Physical Vapor Deposition




PACKAGE:
     1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
     2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
     3 Responsible for the damage during the shipping process, will change the damage part for you for free.
 

DELIVERY TIME: 15-20 days after confirming order,detail delivery date should be decided according to production season and order quantity

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CONTACT US

Contact: Lily You

Phone: +86 18650702009

Tel: +86 18650702009

Email: saleskatbattery@gmail.com

Add: ‌No. 988 Xiahe Road, Siming District, Xiamen City